Products
Dimensions and weight
Length: 818mm, width: 590, height: 396mm, weight: about 70Kg
Wavelength Range
174~520 nm
Argon
Purity: 99.999%, Pressure: 0.5MPa
EXPEC 4820 metals analyzer is a new generation spectrometer developed by EXPEC Technology based on the company 's full spectrum emission spectroscopy technology and high-end argon self- purification technology. The instrument was released and launched in 2016 by applying the company's full spectrum spectrometer M4000 instrument platform , and has experienced many years of market testing for stability and reliability. The new EXPEC 4820 spectrometer uses a scientific research grade CMOS sensor as the detectors and patented argon self-purification technology , which has excellent performance and can meet the analysis needs from mid to high-end users.
The argon self-purification technology uses a pump to extract the argon in the optical chamber , purifies it with an argon purifier and then returns it into the optical chamber , thereby maintaining a high purity argon environment in the optical chamber.
EXPEC 4820 | EXPEC 4850 | ||
Optical System | Paschen-Runge optical system using multiple high-performance CMOS detectors | ||
Optical chamber with argon self-purification system | Dual chamber argon purging optical system | ||
Wavelength Range: 174~520 nm | Wavelength Range:140~680nm | ||
Source | Programmable full digital pulse source | ||
High energy pre-ignition technology, ignition pulse: 1~14Kv | |||
Maximum discharge frequency: 1000Hz, Maximum discharge current: 400A | |||
Spark excitation pulse: 20~230V, Arc excitation pulse: 20~60 V | |||
Power supply and environmental requirements | Power supply voltage: (220 ± 20) V AC, (50 ± 1) Hz, single power supply with protective grounding | ||
Maximum excitation frequency: 400W, Average standby power: 50W | |||
Working temperature: 10~30 ℃, Storage temperature: 0~45 ℃, Working humidity: 20~80% RH | |||
Spark Stand | Opened sample operation platform, which can be equipped with various sample adapters for special applications to meet different small sample analysis needs | ||
Optimized argon flushing design, better argon saving and spark stability. | |||
Easy to clean and maintain, intelligent reminder of maintenance cycle. | |||
Argon | Aperture of spark stand: 13mm (optional: 6mm) | ||
Purity: 99.999%, Pressure: 0.5MPa | |||
Burning flow is about 3.5L/min, maintaining and standby flow is about 0.1L/min | Burning flow is about 3.5L/min, maintaining and standby flow is about 0.2L/min | ||
Dimensions and weight | Length: 818mm, width: 590, height: 396mm weight: about 70Kg | Length: 623mm, width: 735mm, height: 443mm weight: about 70Kg | |
EMC | IEC 610004-2, 61000-4-4, 61000-4-5 | ||
Model | F | None | Dual optical chamber configuration, best UV analysis capability, capable of accurately analyzing N elements, meeting high-end analysis requirements for various matrixes such as Fe, Al, Cu, Zn, Ni, Ti, Mg, Co, etc. |
N | Suitable for all matrix analysis and can meet the matrix analysis requirements such as Fe, Al, Cu, Ni, and Zn | Dual optical chamber configuration, strong UV analysis capability, meeting various matrix analysis requirements for Fe, Al, Cu, Zn, Ni, Ti, Mg, Co, etc. | |
S | Suitable for nonferrous metal analysis and meet the matrix analysis requirements such as Al, Cu, Zn, and Mg | Single optical chamber configuration to meet Cu, Zn, and Mg etc. |
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